Resistivity
Minority Carrier Lifetime
Dislocation Density
Doped Elements
It's a tradition, but also a leader for the future
Ultra high efficiency | Stable and reliable | Extremely low attenuation | Excellent conductivity
Product Model | YSG210 | |
Geometric Shape | All aspects | |
Chamfer Edge Shape | Arc | |
Wafer Edge Distance | 210±0.25 mm | Measured by wafer automatic inspection equipment |
Silicon Wafer Diameter | φ295±0.25 mm | Measured by wafer automatic inspection equipment |
Verticality | 90±0.15° | Measured by wafer automatic inspection equipment |
Thickness | 155±10 um or 150±10 um | Measured by wafer automatic inspection equipment |
Batch Thickness | ≥155 um or ≥150 um | Measured by wafer automatic inspection equipment |
TTV (Total Thickness Variation) | ≤25 um | Measured by wafer automatic inspection equipment |
Line Mark | ≤15 um | Measured by wafer automatic inspection equipment |
Bending Degree | ≤40 um | Measured by wafer automatic inspection equipment |
Warpage Degree | ≤40 um | Measured by wafer automatic inspection equipment |
Cutting Method | Diamond wire cutting | |
Surface Quality | Surface Quality (no oil stains, fingerprints, spots, mortar residue, glue residue) |
Verified by wafer automatic inspection equipment |
Edge Chipping | Depth ≤ 0.3 mm & length ≤ 0.5 mm, no more than 1 per wafer, no V-shaped edge chipping | Inspected manually or by wafer automatic inspection equipment |
Cracks and Air Holes | Not allowed | Measured by wafer automatic inspection equipment |
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